纳米晶Ba(Zr0.2Ti0.8)O3薄膜的外延生长与介电特性

纳米晶Ba(Zr_0.2Ti_0.8)O₃薄膜的外延生长与介电特性

摘要: 用脉冲激光沉积工艺在半导体(001)SrTiO3∶ω(Nb)=1.0%单晶基片上,外延生长出Ba(Zr0.2Ti0.8)O3(简称BZT)介电薄膜.在650℃原位退火10 min,薄膜为(001)外延生长的晶粒.薄膜的晶化特征与表面形貌用薄膜X-ray衍射仪和原子力显微镜测量完成.BZT薄膜(002)峰的半峰宽只有0.72°,说明薄膜晶化良好;薄膜的平均晶粒为90 nm,表面均方根粗糙度为4.3 nm,说明薄膜表面平整.在室温、100 kHz和500 kV/cm条件下,BZT的最大介电常数和调谐百分率分别达到317和65%. 更多还原

Abstract: Highly oriented Ba(Zr0.2Ti0.8)O3 thin films are grown on(001) SrTiO3∶ω(Nb)=1.0 % single crystal substrates using pulsed laser deposition and the dielectric properties of the films are evaluated.The thin films are in situ annealed at 650 ℃ for 10 min.and the highly(001)-oriented BZT thin films are obtained.The structure and surface morphology of the films have been characterized by X-ray diffraction(XRD) and atomic force microscopy(AFM).XRD and AFM characterization reveal a good crystallinity:the...