PCB激光投影光刻照明系统的设计

广东工业大学学报 ›› 2007, Vol. 24 ›› Issue (2): 33-35.

PCB激光投影光刻照明系统的设计

广东工业大学物理与光电工程学院；广东工业大学物理与光电工程学院广东广州510006；广东广州510006；

出版日期:2007-07-02 发布日期:2007-07-02
基金资助:
广州市科技计划项目(2006Z3-D0041)

Design of the Illumination System for Laser Projection Lithography

(Faculty of Physics and Opto-electronic Engineering,Guangdong University of Technology,Guangzhou 510006,China)

Online:2007-07-02 Published:2007-07-02

摘要/Abstract

摘要： 针对大面积、高产量和节约型印制电路板(PCB)生产使用的激光投影光刻机,利用ZEMAX工程光学设计软件,对其照明系统进行了模拟设计与优化,并对优化后的结果进行了分析.对于设计的照明系统,其像面均匀性、光斑大小和形状、像差以及照明系统与投影物镜的匹配都符合实际要求.

关键词: 印制电路板；激光投影光刻；照明系统；

Abstract: For the laser projection lithography system used for the production of large-area,high processing throughput,and cost-effective printed circuit boards(PCB),its illumination system is simulation-designed and optimized using ZEMAX optical design software,and the optimized results are analyzed.The designed results,including uniform of image plane,size and shape of beam geometry,aberration as well as matching of illumination system with projection lens,fulfill the demands of laser illumination syste...

Key words: printed circuit board(PCB)； laser projection lithography； illumination system；

林清华；李文静；宋超；王鲁宾； . PCB激光投影光刻照明系统的设计[J]. 广东工业大学学报, 2007, 24(2): 33-35.

LIN Qing-hua,LI Wen-jing,SONG Chao,WANG Lu-bin. Design of the Illumination System for Laser Projection Lithography[J]. Journal of Guangdong University of Technology, 2007, 24(2): 33-35.

参考文献

[1] 林大键,李展. 亚微米i线投影光刻物镜的光学设计与研制[J]. 光电工程. 1997(S1)

[2] 匡丽娟,翟金会,阮玉,宋镜明,胡勇. 复眼透镜阵列应用于均匀照明系统的特性研究[J]. 光学与光电技术. 2005(06)

[3] 杜国军,陈涛,左铁钏. 应用于准分子激光的透镜阵列均束器[J]. 光电子·激光. 2005(03)

[4] 张强. 分步投影光刻机的照明光学系统[J]. 航空精密制造技术. 1996(06)

[5] 段立安. 一种可实用的照明曝光系统[J]. 电子工业专用设备. 2004(02)

[6] 李尧. i线(365nm)分步投影光刻机曝光系统[J]. 电子工业专用设备. 2001(04)

[7] JAIN K,DUNN TJ,BLACK P P.High-speed,high-reso-lution large-area exposure system for PCB patterning. Printed Circuit Fabrication . 1997

[8] JAIN K,ZEMEL M,KLOSNER M.Large-area high-reso-lution lithography and photoablation systems for microelec-tronics and optoelectronics fabrication. Proceedings ofthe IEEE . 2002

Metrics

Viewed

Full text

Abstract

Cited

Shared

Discussed