Journal of Guangdong University of Technology ›› 2024, Vol. 41 ›› Issue (06): 39-44.doi: 10.12052/gdutxb.240004

• Integrated Circuit Science and Engineering • Previous Articles    

Wide-range Body Bias Adjustment Circuit Design Based on 22 nm FDSOI RVT Process

Lan Hao-yuan1, Cai Shu-ting2, Xiong Xiao-ming2, Wang Zhi-an3, Zhang Xiao-hui3, Wang Jian-ping3, Guo Jin-cai3, Li Jian-zhong3, Li Bin-hong3   

  1. 1. School of Automation, Guangdong University of Technology, Guangzhou 510006, China;
    2. School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China;
    3. Guangdong Greater Bay Area Institute of Integrated Circuit and System, FDSOI Core Chip and Featured IP Center, Guangzhou 510535, China
  • Received:2024-01-04 Published:2024-12-31

Abstract: Leakage power consumption is a key issue in integrated circuit applications, and body bias adjustment technology is one of the most commonly used power consumption adjustment technologies. The traditional body bias adjustment circuit has problems such as small bias voltage range and multiple power supply voltages, which not only increases the cost of the entire system, but also limits the optimization effect of body bias adjustment technology. Based on the 22 nm FDSOI (Fully Depleted Silicon on Insulator) RVT (Regular Voltage Threshold) process, a wide-range body bias adjustment circuit suitable for 22 nm FDSOI RVT digital integrated circuits is proposed. This circuit has a programmable (0 V, ±2 V) wide voltage output range, can achieve 50 mV bias voltage resolution, and does not require additional power input. The test circuit was implemented based on the 22 nm FDSOI process. The simulation results show that the body bias adjustment circuit proposed in this design can reduce the standby leakage of the test circuit by 34% to 92% and has a wide performance tracking range.

Key words: 22 nm FDSOI, body bias adjustment, leakage power, reverse body bias

CLC Number: 

  • TN402
[1] WANG A, CHANDRAKASAN A. A 180 mV FFT processor using subthreshold circuit techniques[C]//2004 IEEE International Solid-State Circuits Conference. San Francisco: IEEE, 2004: 292-293.
[2] HANSON S, ZHAI B, SEOK M, et al. Performance and variability optimization strategies in a sub-200 mV, 3.5 pJ/inst, 11 nW subthreshold processor[C]//2007 IEEE Symposium on VLSI Circuits. Kyoto: IEEE, 2007: 152-153.
[3] BOL D, SCHRAMME M, MOREAU L, et al. Sleeprunner: a 28 nm FDSOI ULP cortex-M0 MCU with ULL SRAM and UFBR PVT compensation for 2.6–3.6 μW/DMIPS 40~80 MHz active mode and 131 nW/kB fully retentive deep-sleep mode [J]. IEEE Journal of Solid-State Circuits, 2021, 56(7): 2256-2269.
[4] 赵晓松, 顾祥, 张庆东, 等. 全耗尽绝缘层上硅技术及生态环境简介[J]. 电子与封装, 2022, 22(6): 060501.
ZHAO X S, GU X, ZHANG Q D, et al. Introduction to fully depleted silicon on insulator technology and its ecosystem [J]. Electronics & Packaging, 2022, 22(6): 060501.
[5] MONFRAY S, SKOTNICKI T. UTBB FDSOI: Evolution and opportunities [J]. Solid-State Electronics, 2016, 125: 63-72.
[6] MAGARSHACK P, FLATRESSE P, CESANA G. UTBB FD-SOI: a process/design symbiosis for breakthrough energy-efficiency[C]//2013 Design, Automation & Test in Europe Conference & Exhibition (DATE) . Grenoble: IEEE, 2013: 952-957.
[7] GRENOUILLET L, CASTELLANI N, PERSICO A, et al. 16 kbit 1T1R OxRAM arrays embedded in 28 nm FDSOI technology demonstrating low BER, high endurance, and compatibility with core logic transistors[C]//2021 IEEE International Memory Workshop (IMW). Dresden: IEEE, 2021: 1-4.
[8] ZHENG Q, CUI J, XU L, et al. Total Ionizing dose responses of forward body bias ultra-thin body and buried oxide FD-SOI transistors [J]. IEEE Transactions on Nuclear Science, 2019, 66(4): 702-709.
[9] OVERWATER R W J, BABAIE M, SEBASTIANO F. Cryogenic-aware forward body biasing in bulk CMOS [J]. IEEE Electron Device Letters, 2023, 45(2): 152-155.
[10] GE H, XIE T, REN Z, et al. Analysis of back-gate bias impact on 22 nm FDSOI SRAM cell [J]. Solid-State Electronics, 2022, 196: 108418.
[11] KUODA T, FUJITA T, MITA S, et al. A 0.9 V 150 MHz 10 mW 4 mm2 2-D discrete cosine transform core processor with variable threshold-voltage (VT) Scheme [J]. IEEE Journal of Solid-State Circuits, 1996, 31(11): 1770-1779.
[12] MIYAZAKI M, ONO G, ISHIBASHI K. A 1.2 GIPS/W microprocessor using speed-adaptive threshold-voltage CMOS with forward bias [J]. IEEE Journal of Solid-State Circuits, 2002, 37(2): 210-217.
[13] BLAGOJEVIĆ M, COCHET M, KELLER B, et al. A fast, flexible, positive and negative adaptive body-bias generator in 28 nm FDSOI[C]//2016 IEEE Symposium on VLSI Circuits (VLSI-Circuits) . Honolulu: IEEE, 2016: 1-2.
[14] SUMITA M, SAKIYAMA S, KINOSHITA M, et al. Mixed body bias techniques with fixed Vt and Ids generation circuits [J]. IEEE Journal of Solid-State Circuits, 2005, 40(1): 60-66.
[15] SIDDIQI A, JAIN N, RASHED M. Back-bias generator for post-fabrication threshold voltage tuning applications in 22 nm FD-SOI process[C]//2018 19th International Symposium on Quality Electronic Design (ISQED). Santa Clara: IEEE, 2018: 268-273.
No related articles found!
Viewed
Full text


Abstract

Cited

  Shared   
  Discussed   
No Suggested Reading articles found!