高功率脉冲磁控溅射技术沉积硬质涂层研究进展

doi:10.3969/j.issn.1007-7162.2013.04.001

Journal of Guangdong University of Technology ›› 2013, Vol. 30 ›› Issue (4): 1-13.doi: 10.3969/j.issn.1007-7162.2013.04.001

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Progress of High Power Impulse Magnetron Sputtering for Deposition of Hard Coatings

Wang Qi-min¹， Zhang Xiao-bo²， Zhang Shi-hong³，Wang Cheng-yong¹，Wu Shang-hua¹

1.Advanced Cutting Tools and Ceramics Center, Guangdong University of Technology, Guangzhou 510006, China;
2.Shenzhen SuPro Instruments Company Limitied，Shenzhen 518054, China;
3.School of Materials Science and Engineering, Anhui University of Technology, Ma’anshan 243011, China

Received:2013-11-18 Online:2013-12-30 Published:2013-12-30

Abstract

Abstract: High power impulse magnetron sputtering (HIPIMS) is an emerging highionization physical vapor deposition technology which was has gained substantial interests. It utilizes pulses of high peak power density (2-3 orders higher than the conventional magnetron sputtering) and low duty cycle (0.5%-10%) leading to high ionization of metal atoms. This mode has distinguished advantages during deposition: high adhesive strength, controllable microstructure and phase structure, and decreased residual stress, etc. This review covers the basic principle of HIPIMS, the characteristic of films & coatings deposited by HIPIMS, and the developments of HIPIMS technologies in the recent 10 years: optimization of coatingsubstrate interface in the coated cutting tools, deposition of highperformance hard coatings, nanolayered/nanocomposite coatings by hybrid HIPIMS, oxide coatings, lowtemperature coatings, etc. 

Key words: high power impulse magnetron sputtering; ionization ratio; hard coating; reactive sputtering

WANG Qi-Min, ZHANG Xiao-Bo, ZHANG Shi-Hong, WANG Cheng-Yong, WU Shang-Hua. Progress of High Power Impulse Magnetron Sputtering for Deposition of Hard Coatings[J].Journal of Guangdong University of Technology, 2013, 30(4): 1-13.